72 DPI Image
150 DPI Image
300 DPI Image
|
| Title: |
Extreme Ultraviolet Photoresists |
| Description: |
NIST researchers exposed a 300 mm silicon wafer with incrementally increasing doses of extreme ultraviolet light (EUV) in 15 areas. After the wafer was developed, the team determined that the seventh exposure was the minimum dose required (E0) to fully remove the resist.
*Physics
|
| Subjects (names): |
|
| Topics/Categories: |
Physics--Optics
|
| Type: |
Graphic/illustration |
| Source: |
National Institute of Standards and Technology |
Credit Line as it should
appear in print: |
Credit: NIST |
| AV Number: |
08PHY013 |
| Date Created: |
2008 |
| Date Entered: |
6/24/2008 |
