Skip Navigation
NIST Image Gallery [skip navigation] Contact NIST go to A-Z subject index go to NIST homepage Search NIST webspace NIST logo--go to NIST Homepage

NIST Image Gallery

Home | About | Browse | Search

Image Gallery : Image Details
thumbnail
 72 DPI Image 
 150 DPI Image 
 300 DPI Image 
Title: Semiconductors
Description: Nanotough: Typical low-k film test for material toughness using the new NIST technique. The indentation instrument that punches the triangular hole registers the forces involved. That plus the length of the resulting cracks determines the toughness of the film, which is about 2.4 micrometers thick. (Color added for clarity.)

MSEL

See also http://www.nist.gov/pml/div683/toughness-122308.cfm.
Subjects (names):
Topics/Categories: Electronics--Semiconductors
Type: Graphic/scientific data
Source: National Institute of Standards and Technology
Credit Line as it should
appear in print:
Credit: NIST
AV Number: 08MSEL018
Date Created: 2008
Date Entered: 12/9/2008

Home | About | Browse | Search