72 DPI Image
150 DPI Image
300 DPI Image
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| Title: |
Semiconductors |
| Description: |
Nanotough: Typical low-k film test for material toughness using the new NIST technique. The indentation instrument that punches the triangular hole registers the forces involved. That plus the length of the resulting cracks determines the toughness of the film, which is about 2.4 micrometers thick. (Color added for clarity.)
*MSEL
|
| Subjects (names): |
|
| Topics/Categories: |
Electronics--Semiconductors
|
| Type: |
Graphic/scientific data |
| Source: |
National Institute of Standards and Technology |
Credit Line as it should
appear in print: |
Credit: NIST |
| AV Number: |
08MSEL018 |
| Date Created: |
2008 |
| Date Entered: |
12/9/2008 |
