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Title: Chemistry, materials, Nanoscale strains
Description: Confocal Raman microscopy image of stress in a silicon crystal caused by indentation with a 20 micrometer long wedge. The image does not show the silicon but rather the magnitude of stress in the crystal, with compressive stress around the wedge going up from the base line. Vampiric red fangs reveal tensile stress associated with cracking at the ends of the indentation.
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*CSTL, stress test, nanoscale strain, crystal, Raman microsopy, silicon, tensile stress, comressive stress, measurement
Subjects (names):
Topics/Categories:
Type: Graphic/scientific data
Source: National Institute of Standards and Technology
Credit Line as it should
appear in print:
Stranick/NIST
AV Number: 08CSTL015
Date Created: 2008
Date Entered: 11/25/2008

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