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Title: Extreme Ultraviolet Photoresists
Description: NIST researchers exposed a 300 mm silicon wafer with incrementally increasing doses of extreme ultraviolet light (EUV) in 15 areas. After the wafer was developed, the team determined that the seventh exposure was the minimum dose required (E0) to fully remove the resist.

*Physics
Subjects (names):
Topics/Categories: Physics--Optics
Type: Graphic/illustration
Source: National Institute of Standards and Technology
Credit Line as it should
appear in print:
Credit: NIST
AV Number: 08PHY013
Date Created: 2008
Date Entered: 6/24/2008

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