72 DPI Image
150 DPI Image
No 300 DPI Version
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| Title: |
Photolithography Process |
| Description: |
Schematic of the photolithography process shows the formation of a gradient extending from the photoresist material to be removed (center) into the unexposed portions of the resist on the sides. NIST measurements document the residual swelling fraction caused by the developer that can contribute to roughness in the final developed image.
*NCNR
See also http://www.nist.gov/public_affairs/techbeat/tb2007_1212.htm#photolith.
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| Subjects (names): |
|
| Topics/Categories: |
Nanotechnology--Nanomanufacturing
Neutron Research--NCNR
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| Type: |
Graphic/scientific data |
| Source: |
National Institute of Standards and Technology |
Credit Line as it should
appear in print: |
Credit: NIST |
| AV Number: |
07NCNR002 |
| Date Created: |
December 2007 |
| Date Entered: |
12/11/2007 |
