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Title: Photolithography Process
Description: Schematic of the photolithography process shows the formation of a gradient extending from the photoresist material to be removed (center) into the unexposed portions of the resist on the sides. NIST measurements document the residual swelling fraction caused by the developer that can contribute to roughness in the final developed image.

*NCNR

See also http://www.nist.gov/public_affairs/techbeat/tb2007_1212.htm#photolith.
Subjects (names):
Topics/Categories: Nanotechnology--Nanomanufacturing
Neutron Research--NCNR
Type: Graphic/scientific data
Source: National Institute of Standards and Technology
Credit Line as it should
appear in print:
Credit: NIST
AV Number: 07NCNR002
Date Created: December 2007
Date Entered: 12/11/2007

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