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Title: NIST Team Develops Novel Method for Nanostructured Polymer Thin Films
Description: Schematic of the NIST 'cold zone' annealing process for polymer thin films on a semiconductor wafer. Experiment images are color-coded to show regions with different cylinder orientations, as measured by atomic force microscopy. Relatively rapid transit times (middle) leave a jumble of different regions that become largely homogeneous at slower speeds (right).

*MSEL
Subjects (names):
Topics/Categories: Nanotechnology--Electronics
Type: Graphic/scientific data
Source: National Institute of Standards and Technology
Credit Line as it should
appear in print:
Credit: NIST
AV Number: 07MSEL010
Date Created: September 2007
Date Entered: 9/13/2007

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