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| Title: |
NIST Team Develops Novel Method for Nanostructured Polymer Thin Films |
| Description: |
Schematic of the NIST 'cold zone' annealing process for polymer thin films on a semiconductor wafer. Experiment images are color-coded to show regions with different cylinder orientations, as measured by atomic force microscopy. Relatively rapid transit times (middle) leave a jumble of different regions that become largely homogeneous at slower speeds (right).
*MSEL
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| Subjects (names): |
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| Topics/Categories: |
Nanotechnology--Electronics
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| Type: |
Graphic/scientific data |
| Source: |
National Institute of Standards and Technology |
Credit Line as it should
appear in print: |
Credit: NIST |
| AV Number: |
07MSEL010 |
| Date Created: |
September 2007 |
| Date Entered: |
9/13/2007 |
