This image is copyrighted by the photographer.
This image may be used for any NIST purpose.
Correct photo credit must be provided.
Other organizations may use this image without charge for
editorial articles that mention NIST in accompanying text or a caption.
Correct photo credit must be provided.
"Stock art" use requires permission and may require payment to the photographer.
To receive a high resolution version send an email with the image AV number and title
to inquiries@nist.gov.
72 DPI Image ©
150 DPI Image ©
300 DPI Image ©
|
| Title: |
Bringing Polymer Patterns into Focus |
| Description: |
Working at the NIST Center for Neutron Research, chemical engineer Eric Lin places a semiconductor wafer in the path of a focused neutron beam. The beam is used to determine the size and shape of polymer patterns on the silicon wafer. Twenty-eight magnesium fluoride lenses focus the neutron beam so that the instrument can characterize polymer structures between 100-300 nanometers wide.
*MSEL
|
| Subjects (names): |
Lin, Eric
|
| Topics/Categories: |
|
| Type: |
Photo/Color |
| Source: |
National Institute of Standards and Technology |
Credit Line as it should
appear in print: |
Copyright Robert Rathe |
| Date Created: |
2001 |
| Date Entered: |
3/12/2007 |
