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| Title: |
Furnace bank in the Nanofab |
| Description: |
These high temperature furnaces are used to grow thin oxide layers on silicon wafers, dope the wafers with boron or phosphorus and anneal the wafers.
*CNST, nanofab
See also http://www.nist.gov/public_affairs/factsheet/CNST_factsheet.htm.
|
| Subjects (names): |
Hajdaj, Russell
|
| Topics/Categories: |
Nanotechnology--Nanomanufacturing
|
| Type: |
Photo/Color |
| Source: |
National Institute of Standards and Technology |
Credit Line as it should
appear in print: |
Copyright Robert Rathe |
| AV Number: |
06CNST002 |
| Date Created: |
March 2006 |
| Date Entered: |
1/11/2007 |
