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Title: Electronics; Semiconductors; Nanoscale Line Roughness
Description: A colorized scanning electron microscope image shows the "waviness" or roughness of edges on reference lines made of silicon that are about 100 nanometers wide.

*MEL, lithography, semiconductor, line widths, roughness,

See also http://www.nist.gov/public_affairs/techbeat/tb2005_0616.htm#roughness.
Subjects (names):
Topics/Categories: Electronics--Semiconductors
Nanotechnology--Electronics
Type: Graphic/scientific data
Source: National Institute of Standards and Technology
Credit Line as it should
appear in print:
Credit: B. Bunday, SEMATECH/K. Talbott, NIST
AV Number: 05MEL009
Date Created: June 16, 2005
Date Entered: 6/20/2005

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